
Applicable for die surface defect inspection, dicing street defect inspection, RDL defect inspection before/after wafer dicing in advanced semiconductor packaging, as well as bump height and coplanarity measurement.
Deep learning AI algorithm
Deep learning algorithms enable neural networks to automatically learn features and extract information from massive data through training, performing intelligent analysis on image or video data. The current software integrates five universal algorithms based on CNN and Transformer architectures: classification, segmentation, object detection, character recognition, and unsupervised learning (good product learning). These algorithms demonstrate significant effectiveness in practical applications such as defect recognition in complex environments, component classification, and character reading scenarios. With deeper research, we have not only refined existing model architectures to reduce parameter quantities but also leveraged NVIDIA's efficient deep learning inference engines to implement computational graph optimization, accuracy improvement, layer simplification, multithreading, and batch inference processing. These enhancements have substantially improved model inference speed and efficiency.

· Wafer surface contamination, residual glue, scratches, dicing street defects, and RDL defect detection
- Supports bright field, dark field, photoluminescence, and transmission illumination modes
- Employs industry-leading AI 2.0 detection algorithms
· Full-wafer bump height and coplanarity measurement
- High-speed, high-precision bump height measurement system
· Custom development through deep collaborations with major research institutes and enterprises
Camera configuration: Ultra-high-speed, high-precision, large-format, low-noise industrial camera + IR camera
Lighting configuration: Ultra-high-power bright/dark field white light + IR illumination system
Lens configuration: 2X, 3.5X, 5X, 10X (customizable per client requirements)
Detection resolution: Detectable defects 4.5μm/3μm/2μm/1μm
Repeatability & Reproducibility: ≥99.5%
Detection rate: Underkill=0, Overkill≤0.5%
8-inch Wafer WPH: Includes wafer loading, alignment, and inspection time WPH=108@2X, WPH=65@3.5X, WPH=40@5X, WPH=10@10X
Equipment uptime: ≥97% (Total time - Downtime)/Total time×100%